Yamato PR200 – 200W Barrel Plasma Reactor
The Yamato PR200 is a compact barrel-type plasma reactor with a maximum RF output of 200 W at 13.56 MHz. It is designed for plasma ashing, etching, dry cleaning and surface-treatment applications in materials research, electronics and semiconductor laboratories.
Key Features
- Maximum RF output: 200 W.
- Oscillation frequency: 13.56 MHz.
- Compact barrel chamber design.
- Automatic RF tuning.
- Adjustable RF output for different applications.
- Pyrex glass reaction chamber.
- Oxygen reaction-gas system with flow meter.
Typical Applications
- Plasma ashing and organic residue removal.
- Plasma etching.
- Dry surface cleaning.
- Surface activation and modification.
- Materials, electronics and semiconductor research.
Key Specifications
| Model | PR200 |
| System | DP mode, Barrel type |
| RF output | Max. 200 W |
| Frequency | 13.56 MHz |
| Tuning method | Automatic |
| Reaction chamber | Pyrex glass, Ø100 × 160 mm |
| Reaction gas | 1 oxygen line with flow meter |
| External dimensions | 350 × 400 × 500 mm |
| Power supply | AC115V / AC220V |
| Weight | 25 kg |
Frequently Asked Questions
What is the Yamato PR200 used for?
The PR200 is used for plasma ashing, etching, dry cleaning and surface treatment in materials, electronics and semiconductor research.
What is the maximum RF power of the PR200?
The Yamato PR200 provides a maximum RF output of 200 W at 13.56 MHz.
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