Savannah – Thermal ALD for R&D

Advanced Capabilities for Advanced Research

Veeco is the leading provider of atomic layer deposition (ALD) systems for research and industry worldwide, delivering comprehensive services and versatile, turnkey systems that are accessible, affordable and accurate to the atomic scale. Thin film deposition is our expertise. Our Savannah® Series of thin film deposition tools exemplifies these competencies.

Savannah® has become the preferred system for university researchers worldwide engaged in ALD and looking for an affordable yet robust platform. We have delivered hundreds of these systems in the past decade. Savannah®’s efficient use of precursors and power-saving features substantially reduces the cost of operating a thin film deposition system.

Key features include:

• In-Situ Ellipsometry
• In-Situ QCM
• Self Assembling Monolayers
• 2-Second Cycle Times
• Integrated Ozone
• Low Vapor Pressure Deposition
• Batch Processing
• Glove Box Integration

Savannah® is equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode™ for thin film deposition on Ultra High Aspect Ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1. Savannah® is available in three configurations: S100, S200, and S300. Savannah® is capable of holding substrates of different sizes (up to 300mm for the S300). The Savannah® thin film deposition systems are equipped with heated precursors lines and the option to add up to six lines. Savannah® is capable of handling gas, liquid, or solid precursors.

Savannah® G2 Technical specifications

Substrate Size:

Savannah S100: up to 100 mm
Savannah® S200: up to 200 mm
Savannah® S300: up to 300 mm

Dimensions (w x d x h)

Savannah S100: 585 x 560 x 980 mm
Savannah® S200: 585 x 560 x 980 mm
Savannah® S300: 686 x 560 x 980 mm